CVD-SiC

Product Line

The unique SiC film formation technology by the CVD method
realizes low cost products while having
high-quality characteristics.

There are a lot of technologies and processes utilized by industries in semiconductor manufacturing and semiconductors are produced by their combined results. The SiC products by ADMAP, which has unique CVD-SiC technology cultivated for more than 30 years, provide the characteristics of ultra‐high purity, high corrosion resistance, high oxidation resistance, high heat resistance, and high wear resistance, and the products are now indispensable to semiconductor manufacturing which requires such characteristics with low cost.

Characteristics table