1. UHV-resistant ferrofluid is used for high temperature resistance and low vapor pressure.
2. The differential pumping chamber and main chamber are separated by minuscule conductance. Leaked gases and outgases from baking are emitted to prevent the contamination of the main chamber.
3. The baking conditions are equivalent to that of TMP, which are relatively easy to achieve.
4. The differential pumping system and main pumping system can be integrated in a vacuum of around 10-7 Pa.
5. The sealed unit is of an integrated type, and its structure is simple with a sub pumping port, allowing for a compact design of the entire device.
[Applications]
Devices for UHV processes
Values in the data tables are the result of our test , or calculation and not guaranteed